English

Maskless Lithography by Tuo Tuo Technologies

Maskless Lithography by Tuo Tuo Technologies

TuoTuo Maskless UV Lithography Systems

Distributed in the Nordics by Aralyse

TuoTuo Maskless Lithography System projecting UV pattern onto photoresist-coated wafer
Real-time, high-precision patterning using digital projection lithography technology.

As the official distributor of TuoTuo Technologies in Denmark, Sweden, Norway, Finland, and Iceland, Aralyse provides access to TuoTuo’s advanced Maskless UV Lithography Systems — next-generation solutions for flexible, cost-efficient, and precise microfabrication.

Unlike conventional photolithography, which requires physical masks, TuoTuo’s systems use a Spatial Light Modulator (SLM) or Digital Micromirror Device (DMD) to project UV light patterns directly onto the photoresist surface. This fully digital process enables real-time design updates, rapid prototyping, and sub-micron accuracy for both research and small-scale production.

Precision & Flexibility

  • Eliminates physical photomasks – fully digital pattern projection
  • Critical dimension (CD) down to ~0.4 µm
  • Supports substrates up to 200 mm × 200 mm

System Configurations

  • Models: UV Litho-Y, UV Litho-ACA, UV Litho-S/S+, and UV Litho-Pro
  • Adaptable for MEMS, photonics, and metamaterials
  • High-speed pattern switching with digital light control

Efficiency & Workflow

  • Real-time pattern updates via computer interface
  • No mask alignment or cleaning required
  • Low operating cost and short turnaround time

Applications

  • MEMS & Microdevices: rapid prototyping and R&D-scale production
  • Optoelectronics: photonic structures, micro-LED arrays, and thin-film devices
  • Metamaterials: high-precision periodic grating and surface patterning
  • Semiconductors: maskless wafer exposure for small-batch processing
  • Education & Research Labs: teaching tool for photolithography principles