Maskless UV Lithography

Overview

Tuo Tuo's Maskless UV Lithography systems harness Spatial Light Modulator (SLM) technology built on Digital Micromirror Devices (DMD) to project UV patterns directly onto photoresist surfaces — completely eliminating the need for physical photomasks.

This enables real-time design modifications, dramatically shorter development cycles, and sub-micron patterning accuracy. Researchers and engineers can go from CAD design to exposed substrate in minutes rather than days.

Key Advantages

• No physical masks needed — design changes applied instantly via software
• Sub-micron resolution with high-precision DMD pixel control
• Rapid prototyping — iterate designs in minutes, not days
• Multi-lens switching system for flexible magnification and field of view
• Compatible with standard photoresists and substrates
• Significantly lower cost-per-iteration compared to mask-based lithography

Applications

• Microfluidic chip prototyping and development
• MEMS device fabrication and R&D
• Micro-optics and diffractive optical elements
• Microneedle arrays for biomedical applications
• Photomask fabrication
• Semiconductor research and small-batch production